发明名称 SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER READABLE RECORDING MEDIUM IN WHICH SUBSTRATE LIQUID PROCESSING PROGRAM IS RECORDED
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus and a substrate liquid processing method, capable of applying a water-repellant treatment on a substrate favorably. <P>SOLUTION: The present invention is related to a substrate liquid processing apparatus (1) for applying a water-repellent treatment to a substrate (2) with a water-repellent treatment liquid, as well as a substrate liquid processing method and a computer readable recording medium in which a substrate liquid processing program is recorded. In a mixing tank (53), a first dilution liquid capable of diluting a water-repellent treatment liquid without hydrolysis is mixed with a water-repellent treatment liquid to prepare a first diluted water-repellent treatment liquid. The substrate (2) is applied with the first diluted water-repellent treatment liquid for water-repellent treatment. A second dilution liquid is supplied for diluting the water-repellent treatment liquid to a middle part of a first supply flow passage (54) which supplies the first diluted water-repellent treatment liquid from the mixing tank (53). The first diluted water-repellent treatment liquid is diluted with the second dilution liquid to prepare a second diluted water-repellent treatment liquid. The substrate (2) is applied with the second diluted water-repellent treatment liquid for water-repellent treatment. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012138482(A) 申请公布日期 2012.07.19
申请号 JP20100290163 申请日期 2010.12.27
申请人 TOKYO ELECTRON LTD 发明人 NAKAMORI MITSUNORI;KAMIKO HIDETOMO;TOSHIMA TAKAYUKI
分类号 H01L21/304;H01L21/027 主分类号 H01L21/304
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