发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A ferroelectric capacitor formed above a semiconductor substrate includes a lower electrode, a dielectric film (ferroelectric film) having ferroelectric characteristics, and an upper electrode. The upper electrode includes a conductive oxide film made of a ferroelectric material to which conductivity is provided by adding a conductive material such as Ir, and the conductive oxide film is in contact with the dielectric film.
申请公布号 US2012181659(A1) 申请公布日期 2012.07.19
申请号 US201113301396 申请日期 2011.11.21
申请人 WANG WENSHENG;FUJITSU SEMICONDUCTOR LIMITED 发明人 WANG WENSHENG
分类号 H01L21/20;H01L29/92 主分类号 H01L21/20
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