发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocatalytic layer interposed therebetween; and separating the element forming layer from the substrate having the light transmitting property after the photocatalytic layer is irradiated with light through the substrate having the light transmitting property.
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申请公布号 |
US2012182598(A1) |
申请公布日期 |
2012.07.19 |
申请号 |
US201213431073 |
申请日期 |
2012.03.27 |
申请人 |
MORISUE MASAFUMI;JINBO YASUHIRO;FUJII GEN;KIMURA HAJIME;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
MORISUE MASAFUMI;JINBO YASUHIRO;FUJII GEN;KIMURA HAJIME |
分类号 |
G02F1/167 |
主分类号 |
G02F1/167 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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