ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an actinic-ray-sensitive or radiation-sensitive resin composition capable of forming a good pattern shape excellent in roughness characteristics without film reduction or trailing, and an actinic-ray-sensitive or radiation-sensitive film and a pattern forming method using the composition.

SOLUTION: An actinic-ray-sensitive or radiation-sensitive resin composition contains (A) a resin which decomposes by an action of an acid to increase the solubility of the resin in an alkaline developer, (B) an onium salt which includes a nitrogen atom in a cation portion and generates an acid by being decomposed upon irradiation with an actinic-ray or a radiation and (C) a compound represented by the following general formula (1-1) or (1-2) which generates an acid upon irradiation with an actinic-ray or a radiation. (In the general formulas (1-1) and (1-2), each symbol represents the meaning described in the description.)

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