WAFER TABLE FOR IMMERSION LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a method and a device which can substantially confine the liquid between the lens and the wafer table assembly of an immersion lithography system.

SOLUTION: An exposure device includes a lens and a wafer table assembly. The wafer table assembly has an upper surface and is arranged to be moved for the lens or at least one component while supporting a wafer. The upper surface of the wafer and the upper surface of the component are substantially flush with the upper surface of the wafer table assembly. The entire upper surface of the wafer table assembly including the upper surface of the wafer, the upper surface of the wafer table assembly and the upper surface of at least one component is substantially planer.

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