| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a defect inspection method and device solving the problem in which it is difficult to detect a defect and calculate a dimension thereof in a short time at high sensitivity, without thermally damaging a sample by a conventional technique. <P>SOLUTION: A defect inspection method comprises: lighting a surface area of a sample as an object to be inspected under a predetermined lighting condition (lighting step); translating and rotating the sample (sample scanning step); dividing each of a plurality of scattered light beams scattered in a plurality of directions from the lighting area of the sample, into a plurality of pixels to detect the divided light beam, for each of a scanning direction at the sample scanning step and a direction approximately perpendicular to the scanning direction (scattered light beam detection step); and adding a scattered light beam scattered in an approximately same direction from an approximately same area of the sample to each of the plurality of scattered light beams detected at the scattered light beam detection step, determining the presence or absence of a defect based on the scattered light beam added, and calculating the dimension of the determined defect using at least one of a plurality of scattered light beams corresponding to the determined defect (processing step). <P>COPYRIGHT: (C)2012,JPO&INPIT |
