ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which may suppress the elution of a photoacid generator to an immersion liquid and have an excellent immersion liquid follow-up property and further is excellent in roughness characteristics, and an actinic-ray-sensitive or radiation-sensitive film and a pattern forming method using the composition.

SOLUTION: An actinic-ray-sensitive or radiation-sensitive resin composition contains (A) a compound represented by the following formula (I) which generates an acid upon irradiation of an actinic ray or a radiation and (B) a resin which decomposes by an action of an acid to increase the solubility of the resin in an alkaline developer. (In the general formula (I), n represents an integer of 2 or more and X represents a hydrocarbon group.)

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