发明名称 FIRING FURNACE CONFIGURATION FOR THERMAL PROCESSING SYSTEM
摘要 A thermal processing system for processing work pieces such as silicon wafers for photovoltaic cells. The system include a firing furnace comprised of upper and lower banks for microzones having infrared lamps in each microzone. The microzone are lined with or formed of a reflective insulative material. Some embodiments of the system of the invention can be used as or in a continuous infrared furnace of oven having a drying, burn-off and firing zone.
申请公布号 US2012181265(A1) 申请公布日期 2012.07.19
申请号 US201113183957 申请日期 2011.07.15
申请人 MENARD JEAN PIERRE;DESPATCH INDUSTRIES LIMITED PARTNERSHIP 发明人 MENARD JEAN PIERRE
分类号 F27D11/00 主分类号 F27D11/00
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