| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which shows a great contrast of a solubility rate regardless of the kind of a polymer precursor, especially of a polyimide precursor, and consequently can give a pattern with an excellent shape at a low cost while retaining a sufficient process margin. <P>SOLUTION: The photosensitive resin composition comprises benzhydryl ammonium salt of formula (1) and a polymer precursor. In the formula, R<SP>1</SP>-R<SP>13</SP>are each independently hydrogen or a monovalent organic group. R<SP>14</SP>is hydrogen or a monovalent organic group. A is a compound or an element which can become an anion. <P>COPYRIGHT: (C)2007,JPO&INPIT |
