发明名称 EXTENSIONS OF SELF-ASSEMBLED STRUCTURES TO INCREASED DIMENSIONS VIA A BOOTSTRAP SELF-TEMPLATING METHOD
摘要 <p>A semiconductor structure comprises a first self-assembled block copolymer material within a trench in a substrate and a second self-assembled block copolymer material overlying the first self-assembled block copolymer material. The first self-assembled block copolymer material comprises self-assembled polymer domains registered to sidewalls of the trench and extending a length of the trench. The second self-assembled block copolymer material comprises self-assembled polymer domains overlying and registered to the self-assembled polymer domains of the first self-assembled block copolymer material. The first self-assembled block copolymer material comprises a different material from the first self-assembled block copolymer material. A template comprises lines extending a length of a trench in a substrate and separated by openings exposing a floor of the trench in a substrate. Each of the lines comprises the first self-assembled block copolymer material and the second self-assembled block copolymer material overlying the first self-assembled block copolymer material.</p>
申请公布号 KR101166619(B1) 申请公布日期 2012.07.18
申请号 KR20097024258 申请日期 2008.04.09
申请人 发明人
分类号 B81C99/00;B81C1/00;G03F7/00;H01L21/033 主分类号 B81C99/00
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