发明名称 METHOD FOR PROCESSING FRAGILE MATERIAL SUBSTRATE
摘要 <p>Provided is a method for processing a fragile material substrate that can carry out stable laser break processing. A method for processing a fragile material substrate comprises (a) an initial crack forming step of forming an initial crack on a scribe scheduled line adjacent to the edge of a first substrate, (b) a laser scribe step of relatively moving a beam spot of the first laser irradiation from the edge of the first substrate to the edge of a second substrate along the scribe scheduled line to heat the substrates, immediately cooling a portion where the beam spot has passed, and forming a scribe line with a limited depth along the scribe scheduled line by using a stress gradient in the depth direction caused in the scribe scheduled line, and (c) a laser break step of relatively moving a beam spot of the second laser irradiation from the edge of the second substrate to the edge of a first substrate along the scribe line in the reverse direction to make the scribe line penetrate further deeply or completely cuts off the scribe line.</p>
申请公布号 KR101165982(B1) 申请公布日期 2012.07.18
申请号 KR20107025335 申请日期 2009.03.16
申请人 发明人
分类号 B23K26/38;B23K26/08;B28D5/00;C03B33/09 主分类号 B23K26/38
代理机构 代理人
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