| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for correcting defects of an ITO film, by which defect parts of an ITO film, especially, in a color filter forming substrate used for a liquid crystal display panel of MVA mode with high quality display or in a substrate in an intermediate process for manufacturing the color filter forming substrate, can be locally and easily corrected. <P>SOLUTION: In the method for correcting defects of an ITO film, an applying process in which a mixed solution obtained by dispersing a solid electroconductive material (electroconductive particles) in a solvent, is applied to the defect part of the ITO film, is performed one or more times at needed and a transparent electroconductive film is formed on the defect part of the ITO film. The solid electroconductive material is ITO. <P>COPYRIGHT: (C)2008,JPO&INPIT |
