发明名称 |
COATING SOLUTION FOR SURFACE FLAT INSULATING FORMATION, SURFACE FLAT INSULATING FILM COVERING BASE MATERIAL, AND PROCESS FOR PRODUCING SURFACE FLAT INSULATING FILM COVERING BASE MATERIAL |
摘要 |
<p>A coating solution for forming a flat-surface insulating film, which is a coating solution obtained by dissolving a poly(diorgano)siloxane A having a mass average molecular weight of 900 to 10,000 and a metal alkoxide B in an organic solvent C and further adding water, wherein the molar ratio A/B of the poly(diorgano)siloxane A to 1 mol of the metal alkoxide B is from 0.05 to 1.5, the organic solvent C has a hydroxyl group, the solubility of water in 100 g of the organic solvent C is from 3 to 20 g, and the molar ratio C/A of the organic solvent C to 1 mol of the poly(diorgano)siloxane A is from 0.05 to 100. This coating solution for forming a flat-surface insulating film ensures that an organic modified silicate composed of a poly(diorgano)siloxane and a metal alkoxide can be formed as a thick film having 1 µm or more and can be an organic modified silicate insulating film causing no irregularities due to phase separation and having a low Young's modulus and flexibility high enough to follow the deformation of a substrate board, as well as high film surface flatness allowing for mounting of microcomponents of an electronic device or the like.</p> |
申请公布号 |
EP2133394(A4) |
申请公布日期 |
2012.07.18 |
申请号 |
EP20080739384 |
申请日期 |
2008.03.25 |
申请人 |
NIPPON STEEL MATERIALS CO., LTD. |
发明人 |
OGURA, TOYOSHI;YAMADA, NORIKO;KUBO, YUJI |
分类号 |
C09D183/04;C09D5/25;C09D7/12;H01B3/46;H01L21/312 |
主分类号 |
C09D183/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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