发明名称 |
Radiation sensitive composition |
摘要 |
<p>The invention discloses a radiation sensitive composition which comprises a novolac resin, a copolymer with metal ions, acid generators and radiation absorptive dyes. The composition is coated on an applicable substrate. The coated substrate is baked, exposed and developed to produce an image, which has desirable hardness, abrasion-resistance, adhesiveness and print durability.</p> |
申请公布号 |
EP2366544(B1) |
申请公布日期 |
2012.07.18 |
申请号 |
EP20100013376 |
申请日期 |
2010.10.06 |
申请人 |
FOUNDER FINE CHEMICAL INDUSTRY CO., LTD.;WANG, TUNG-CHI;YEH, CHING-YU |
发明人 |
YEH, CHING-YU;YANG, MING-HWA;LIN, MIN-SHYAN;CHEN, SHIH-CHIEH |
分类号 |
B41C1/10;G03F7/038 |
主分类号 |
B41C1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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