PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A plasma processing apparatus is provided to lead initial discharge of induced coupled plasma by simultaneously forming inductively coupled plasma and capacitively coupled plasma. CONSTITUTION: A CCP(Capacitively Coupling Plasma) frame(140) can be installed on the same plane as a window frame(130) in a central portion of the window frame. One dielectric window can be located inside the CCP frame. A plurality of dielectric windows can be located on each space divided into a lattice type inside the CCP. The window frame is located in order to support a plurality of dielectric windows around the CCP frame. The window frame can be composed of an outer frame(131) forming an outer edge of the frame and a plurality of bridge frames(132).