发明名称 Mixed source growth apparatus and method of fabricating III-nitride ultraviolet emitters
摘要 A device for forming a Group III-V semiconductor on a substrate. The device has a primary chamber comprising a substrate and a heat source for heating the substrate to a first temperature. A secondary chamber comprises a metal source and a second heat source for heating the secondary chamber to a second temperature. A first source is provided which is capable of providing HCl to the secondary chamber wherein the HCl and the metal form metal chloride. A metal-organic source is provided. A metal chloride source is provided which comprises a metal chloride. At least one of the metal chloride, the metal-organic and the second metal chloride react with the nitrogen containing compound to form a Group III-V semiconductor on the substrate.
申请公布号 US8222669(B2) 申请公布日期 2012.07.17
申请号 US20090934488 申请日期 2009.03.27
申请人 KHAN ASIF;FAREED QHALID;NITEK, INC. 发明人 KHAN ASIF;FAREED QHALID
分类号 H01L33/40;H01L33/00;H01L33/02 主分类号 H01L33/40
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