发明名称 Method for manufacturing image sensor
摘要 A method for manufacturing an image sensor including forming a microlens array over a color filter array, forming a capping layer over the semiconductor substrate including the microlens array, forming a pad mask over the capping layer, and then exposing a pad in an interlayer dielectric layer.
申请公布号 US8222068(B2) 申请公布日期 2012.07.17
申请号 US20080113965 申请日期 2008.05.02
申请人 RYU SANG-WOOK;TAK BYOUNG-SAEK;DONGBU HITEK CO., LTD. 发明人 RYU SANG-WOOK;TAK BYOUNG-SAEK
分类号 H01L21/00;H01L27/14;H01L27/146;H04N5/335;H04N5/361;H04N5/374 主分类号 H01L21/00
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