发明名称 |
Method for manufacturing image sensor |
摘要 |
A method for manufacturing an image sensor including forming a microlens array over a color filter array, forming a capping layer over the semiconductor substrate including the microlens array, forming a pad mask over the capping layer, and then exposing a pad in an interlayer dielectric layer. |
申请公布号 |
US8222068(B2) |
申请公布日期 |
2012.07.17 |
申请号 |
US20080113965 |
申请日期 |
2008.05.02 |
申请人 |
RYU SANG-WOOK;TAK BYOUNG-SAEK;DONGBU HITEK CO., LTD. |
发明人 |
RYU SANG-WOOK;TAK BYOUNG-SAEK |
分类号 |
H01L21/00;H01L27/14;H01L27/146;H04N5/335;H04N5/361;H04N5/374 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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