| 摘要 |
PURPOSE: A focus ring and a substrate processing apparatus including the same are provided to prevent deposition to be attached to an inner side focus ring by arranging a quartz member to a gap of the inner side focus ring and an outer side focus ring. CONSTITUTION: A focus ring surrounds the edge of a substrate arranged within a processing chamber of a substrate processing device. The focus ring comprises an inner side focus ring(25a) and an outer side focus ring(25b). The inner side focus ring is arranged to be contiguous to the substrate and is cooled. The outer side focus ring surrounds the inner side focus ring. The outer side focus ring is not cooled. A block member(25c) is located in a gap between the inner side focus ring and outer side focus ring. An electric heating sheet(34) is placed between the inner side focus ring and a susceptor. The electric heating sheet transfers heat of the inner side focus ring to the susceptor.
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