发明名称 |
Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure process |
摘要 |
A method of decomposing a target pattern containing features to be imaged onto a substrate into a plurality of exposure patterns for use in a multi-exposure process. The method includes dividing the target pattern into fragments; associating the fragments with an exposure pattern; associating the fragments with image log slope (ILS) evaluation points; and maximizing ILS values. Maximizing the ILS values further includes calculating ILS values at the ILS evaluation points; determining a minimum ILS value; calculating changes in the ILS values as a result of associating fragments with a different exposure pattern; determining a maximum change of the ILS values; and associating fragments associated with the maximum change with a different exposure pattern. |
申请公布号 |
US8224061(B2) |
申请公布日期 |
2012.07.17 |
申请号 |
US20090614208 |
申请日期 |
2009.11.06 |
申请人 |
SOCHA ROBERT JOHN;ASML NETHERLANDS B.V. |
发明人 |
SOCHA ROBERT JOHN |
分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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