发明名称 |
Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus |
摘要 |
To provide a display device which can be manufactured with higher efficiency in the use of material through a simplified manufacturing process, and a method for manufacturing the display device. Another object is to provide a technique by which patterns of a wiring the like which constitutes the display device can be formed to a desired shape with good control. In a method for forming a pattern according to the present invention, a mask is formed over a light-transmitting substrate; a first region including a photocatalyst is formed over the substrate and the mask; the photocatalyst is irradiated with light through the substrate to modify a part of the first region; a second region is formed; and a composition containing a pattern forming material is discharged to the second region, thus, a pattern is formed. The mask does not transmit light. |
申请公布号 |
US8222636(B2) |
申请公布日期 |
2012.07.17 |
申请号 |
US20090616491 |
申请日期 |
2009.11.11 |
申请人 |
FUJII GEN;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
FUJII GEN |
分类号 |
H01L29/08;G03F7/004;G03F7/20;G03F9/00;H01L21/208;H01L21/28;H01L21/3205;H01L21/336;H01L21/77;H01L29/49;H01L35/24;H01L51/00 |
主分类号 |
H01L29/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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