| 摘要 |
PURPOSE: An anti-fingerprint coating method and an apparatus thereof are provided to evenly coat a thin film regardless of the shape of base materials by complexly using an alternating current plasma method and a thermal evaporation method. CONSTITUTION: An anti-fingerprint coating method is as follows. A SiOx(Silicon Dioxide) thin film(x is 1.5-2.0) is evaporated by using an alternating current plasma method. Fluoride compound is evaporated on the surface of base materials having the SiOx thin film through a thermal evaporation method. In order to increase the adhesion strength of the SiOx, the surface of the base materials is reformed by plasma or ion beam before the evaporation of the SiOx thin film.
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