发明名称 DIAZADIENE-BASED METAL COMPOUND, METHOD FOR PREPARING SAME AND METHOD FOR FORMING A THIN FILM USING SAME
摘要 The present invention relates to a diazadiene (DAD)-based metal compound, to a method for preparing the same and to a method for forming a thin film using the same. The diazadiene (DAD)-based metal compound of the present invention is provided in a gaseous state to be formed into a metal thin film or a metal oxide thin film by chemical vapor deposition or atomic layer deposition. Particularly, the diazadiene-based organic metal compound of the present invention has advantages in that it may be formed into a metal thin film or a metal oxide thin film and it can be prepared in a relatively inexpensive way without using highly toxic ligands.
申请公布号 WO2012067439(A3) 申请公布日期 2012.07.12
申请号 WO2011KR08791 申请日期 2011.11.17
申请人 UP CHEMICAL CO., LTD.;HAN, WON SEOK 发明人 HAN, WON SEOK
分类号 C23C16/18;C23C16/44 主分类号 C23C16/18
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