RELEASE DEVICE, RELEASE SYSTEM, RELEASE METHOD, AND COMPUTER STORAGE MEDIUM

摘要

The release device has: a first holder for holding a substrate to be processed, the first holder comprising a heating mechanism for heating the substrate to be processed; a second holder for holding a support substrate, the second holder comprising a heating mechanism for heating the support substrate; a movement mechanism for moving the first holder and/or the second holder in the horizontal direction in relative manner; and an inert-gas feed mechanism for feeding an inert gas to a bonding surface of the substrate to be processed, the bonding surface having been exposed by the relative movement of the first holder and the second holder in the horizontal direction, and the movement being brought about by the movement mechanism. The inert-gas feed mechanism has a porous part provided with a plurality of pores formed thereon, and a gas feed pipe for feeding the inert gas to the porous part, the gas feed pipe being connected to the porous part. The porous part is arranged at a predetermined distance in a vertical direction away from the bonding surface of the substrate to be processed.