发明名称 |
SEMICONDUCTOR FILM, SEMICONDUCTOR ELEMENT, SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD FOR THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor film with stable characteristics, a semiconductor element with stable characteristics, and a semiconductor device with stable characteristics. <P>SOLUTION: Specifically, an oxide semiconductor film includes a seed crystal layer (seed layer) including crystal with a first crystal structure having one surface in contact with an insulation surface and the other surface of the seed crystal layer (seed layer) with grown anisotropic crystal. With such a hetero structure, the semiconductor film can have stable electric characteristics. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012134468(A) |
申请公布日期 |
2012.07.12 |
申请号 |
JP20110255776 |
申请日期 |
2011.11.24 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
YAMAZAKI SHUNPEI;TAKAHASHI MASAHIRO;MARUYAMA YOSHIKI |
分类号 |
H01L21/20;G02F1/1368;H01L21/336;H01L21/363;H01L29/786 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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