发明名称 SEMICONDUCTOR FILM, SEMICONDUCTOR ELEMENT, SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD FOR THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor film with stable characteristics, a semiconductor element with stable characteristics, and a semiconductor device with stable characteristics. <P>SOLUTION: Specifically, an oxide semiconductor film includes a seed crystal layer (seed layer) including crystal with a first crystal structure having one surface in contact with an insulation surface and the other surface of the seed crystal layer (seed layer) with grown anisotropic crystal. With such a hetero structure, the semiconductor film can have stable electric characteristics. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012134468(A) 申请公布日期 2012.07.12
申请号 JP20110255776 申请日期 2011.11.24
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;TAKAHASHI MASAHIRO;MARUYAMA YOSHIKI
分类号 H01L21/20;G02F1/1368;H01L21/336;H01L21/363;H01L29/786 主分类号 H01L21/20
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