发明名称 |
TEMPERATURE SENSOR, METHOD OF MANUFACTURING THE TEMPERATURE SENSOR, SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE, AND METHOD OF CONTROLLING THE SEMICONDUCTOR DEVICE |
摘要 |
A disclosed temperature sensor includes a charge trap structure including a silicon oxide film formed on a substrate; an aluminum oxide film that is formed on the silicon oxide film, wherein oxygen is injected into the aluminum oxide film from an upper surface thereof; and an electrode formed on the aluminum oxide film, wherein a flat band voltage of the charge trap structure is temperature dependent.
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申请公布号 |
US2012176835(A1) |
申请公布日期 |
2012.07.12 |
申请号 |
US201213344699 |
申请日期 |
2012.01.06 |
申请人 |
TANAKA YOSHITSUGU;TOKYO ELECTRON LIMITED |
发明人 |
TANAKA YOSHITSUGU |
分类号 |
H01L37/02;G11C11/417 |
主分类号 |
H01L37/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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