发明名称 TEMPERATURE SENSOR, METHOD OF MANUFACTURING THE TEMPERATURE SENSOR, SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE, AND METHOD OF CONTROLLING THE SEMICONDUCTOR DEVICE
摘要 A disclosed temperature sensor includes a charge trap structure including a silicon oxide film formed on a substrate; an aluminum oxide film that is formed on the silicon oxide film, wherein oxygen is injected into the aluminum oxide film from an upper surface thereof; and an electrode formed on the aluminum oxide film, wherein a flat band voltage of the charge trap structure is temperature dependent.
申请公布号 US2012176835(A1) 申请公布日期 2012.07.12
申请号 US201213344699 申请日期 2012.01.06
申请人 TANAKA YOSHITSUGU;TOKYO ELECTRON LIMITED 发明人 TANAKA YOSHITSUGU
分类号 H01L37/02;G11C11/417 主分类号 H01L37/02
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