发明名称 |
Target Cooling Through Gun Drilled Holes |
摘要 |
A sputter target assembly particularly useful for a large panel plasma sputter reactor having a target assembly sealed both to the main processing chamber and a vacuum pumped chamber housing a moving magnetron. The target assembly to which target tiles are bonded includes an integral plate with parallel cooling holes drilled parallel to the principal faces. The ends of the holes may be sealed and vertically extending slots arranged in two staggered groups on each side and machined down to respective pairs of cooling holes on opposite sides of the backing plate in pairs. Four manifolds tubes are sealed to the four groups of slots and provide counter-flowing coolant paths.
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申请公布号 |
US2012175250(A1) |
申请公布日期 |
2012.07.12 |
申请号 |
US201213420996 |
申请日期 |
2012.03.15 |
申请人 |
TANASE YOSHIAKI;INAGAWA MAKOTO;HOSOKAWA AKIHIRO;APPLIED MATERIALS, INC. |
发明人 |
TANASE YOSHIAKI;INAGAWA MAKOTO;HOSOKAWA AKIHIRO |
分类号 |
C23C14/34;B23P11/00 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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