发明名称 Target Cooling Through Gun Drilled Holes
摘要 A sputter target assembly particularly useful for a large panel plasma sputter reactor having a target assembly sealed both to the main processing chamber and a vacuum pumped chamber housing a moving magnetron. The target assembly to which target tiles are bonded includes an integral plate with parallel cooling holes drilled parallel to the principal faces. The ends of the holes may be sealed and vertically extending slots arranged in two staggered groups on each side and machined down to respective pairs of cooling holes on opposite sides of the backing plate in pairs. Four manifolds tubes are sealed to the four groups of slots and provide counter-flowing coolant paths.
申请公布号 US2012175250(A1) 申请公布日期 2012.07.12
申请号 US201213420996 申请日期 2012.03.15
申请人 TANASE YOSHIAKI;INAGAWA MAKOTO;HOSOKAWA AKIHIRO;APPLIED MATERIALS, INC. 发明人 TANASE YOSHIAKI;INAGAWA MAKOTO;HOSOKAWA AKIHIRO
分类号 C23C14/34;B23P11/00 主分类号 C23C14/34
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