| 摘要 |
PURPOSE: A polishing pad with non-directional and non-uniform surface roughness, and a manufacturing method and apparatus for the same are provided to reduce the break-in time and surface defects in the initial stage of polishing. CONSTITUTION: A polishing pad manufacturing method is as follows. A polishing pad is attached to a rotary platen. A milling cutter is installed to contact the surface of the polishing pad and rotate. The platen and the milling cutter are rotated at the same time so that non-directional and non-uniform surface roughness is formed in the polishing pad. |
