发明名称 PEELING SYSTEM, PEELING METHOD, AND COMPUTER STORAGE MEDIUM
摘要 <p>This peeling system has: a loading/unloading station that loads/unloads substrates to be processed, support substrates, or stacked substrates in which these are made to adhere; a peeling processing station that carries out prescribed processing on substrates to be processed, support substrates and stacked substrates; and a transport station provided between the loading/unloading station and the peeling processing station. The peeling processing station has a peeling apparatus that peels the stacked substrates, a first washing apparatus that washes peeled substrates to be processed, and a second washing apparatus that washes the peeled support substrates. The pressure inside the transport station is a positive pressure in relation to the pressure inside the peeling apparatus, the pressure inside the first washing apparatus, and the pressure inside the second washing apparatus. The pressure inside a transport apparatus is a positive pressure in relation to the pressure inside the peeling apparatus and the pressure inside the first washing apparatus.</p>
申请公布号 WO2012093610(A1) 申请公布日期 2012.07.12
申请号 WO2011JP80048 申请日期 2011.12.26
申请人 TOKYO ELECTRON LIMITED;YOSHITAKA, NAOTO;IWASHITA, YASUHARU;MATSUNAGA, MASATAKA 发明人 YOSHITAKA, NAOTO;IWASHITA, YASUHARU;MATSUNAGA, MASATAKA
分类号 H01L21/02;H01L21/304;H01L21/677;H01L21/683;H01L27/12 主分类号 H01L21/02
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