SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an immersion lithography apparatus in which the likelihood of bubble inclusion is reduced.

SOLUTION: A substrate table WT has a catchment opening 61 formed in an upper surface 62 of the substrate table WT. The catchment opening (or fluid collection opening) 61 is in fluid communication through the substrate table WT with the environment of the substrate table WT at a drain opening 63 in a surface 64 of the substrate table WT other than the upper surface 62. The environment of the substrate table WT is the surrounding environment of the substrate table WT. The undersurface 64 of the substrate table WT is in direct contact with the environment of the substrate table WT.

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