EXPOSURE DEVICE, CLEANING METHOD OF MEMBER THEREOF, MAINTENANCE METHOD OF EXPOSURE DEVICE, MAINTENANCE DEVICE, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure device capable of preventing deterioration in exposure accuracy and measurement accuracy caused by contamination of a member which contacts with a liquid in a liquid immersion region.

SOLUTION: An exposure device EXS forms a liquid immersion region AR2 of a liquid LQ on an image surface side of a projection optical system PL and exposes a substrate P via the projection optical system PL and the liquid LQ of the liquid immersion region AR2. The exposure device EXS is provided with an optical cleaning device 80 which irradiates an upper surface 31 and the like of a substrate stage PST which contacts with the liquid LQ for forming the liquid immersion region AR2 with a predetermined irradiation light Lu having an optical cleaning effect.

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