EXPOSURE DEVICE, EXPOSURE METHOD, MAINTENANCE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method capable of sufficiently exposing a substrate.

SOLUTION: An exposure device (EX) comprises a supply port (8) for supplying a liquid (2) to an optical path space (K) of exposure light (EL), and a liquid supply system (10) for supplying ionized ion liquids (2A, 2B) to the supply port (8).

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