| 发明名称 |
METHODS AND SYSTEMS OF OBJECT BASED METROLOGY FOR ADVANCED WAFER SURFACE NANOTOPOGRAPHY |
| 摘要 |
Disclosed herein is a system and method for enhanced and expanded localized geometry characterization. Objects of interest are classified according to user-defined parameters, and this enables enhanced contrast and more accurate feature detection, as well as more accurately defined feature object regions. |
| 申请公布号 |
US2012179419(A1) |
申请公布日期 |
2012.07.12 |
| 申请号 |
US201113170094 |
申请日期 |
2011.06.27 |
| 申请人 |
CHEN HAIGUANG;SINHA JAYDEEP K.;KAMENSKY SERGEY;KLA-TENCOR CORPORATION |
发明人 |
CHEN HAIGUANG;SINHA JAYDEEP K.;KAMENSKY SERGEY |
| 分类号 |
G06F15/00 |
主分类号 |
G06F15/00 |
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