发明名称 |
INTEGRATED CIRCUIT LINE WITH ELECTROMIGRATION BARRIERS |
摘要 |
An integrated circuit comprising an electromigration barrier includes a line, the line comprising a first conductive material, the line further comprising a plurality of line segments separated by one or more electromigration barriers, wherein the one or more electromigration barriers comprise a second conductive material that isolates electromigration effects within individual segments of the line. |
申请公布号 |
US2012175775(A1) |
申请公布日期 |
2012.07.12 |
申请号 |
US201213424651 |
申请日期 |
2012.03.20 |
申请人 |
HORAK DAVID V.;NOGAMI TAKESHI;PONOTH SHOM;YANG CHIH-CHAO;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HORAK DAVID V.;NOGAMI TAKESHI;PONOTH SHOM;YANG CHIH-CHAO |
分类号 |
H01L23/532 |
主分类号 |
H01L23/532 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|