发明名称 INTEGRATED CIRCUIT LINE WITH ELECTROMIGRATION BARRIERS
摘要 An integrated circuit comprising an electromigration barrier includes a line, the line comprising a first conductive material, the line further comprising a plurality of line segments separated by one or more electromigration barriers, wherein the one or more electromigration barriers comprise a second conductive material that isolates electromigration effects within individual segments of the line.
申请公布号 US2012175775(A1) 申请公布日期 2012.07.12
申请号 US201213424651 申请日期 2012.03.20
申请人 HORAK DAVID V.;NOGAMI TAKESHI;PONOTH SHOM;YANG CHIH-CHAO;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 HORAK DAVID V.;NOGAMI TAKESHI;PONOTH SHOM;YANG CHIH-CHAO
分类号 H01L23/532 主分类号 H01L23/532
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