发明名称 DEPOSITION MATERIAL FOR FORMING THIN FILM, THIN-FILM SHEET HAVING THE THIN FILM, AND LAMINATED SHEET
摘要 <P>PROBLEM TO BE SOLVED: To provide: a deposition material suitable for forming a thin film excellent in transparency and gas barrier property; a thin-film sheet having the thin film; and a laminated sheet. <P>SOLUTION: In the deposition material manufactured by mixing first oxide powder and second oxide powder, the first oxide powder is TiO<SB POS="POST">2</SB>powder, the first oxide purity of the first oxide powder is not lower than 98%, the second oxide powder is one kind of powder or two or more kinds of mixed powder which are selected from a group composed of ZnO, MgO and CaO, the second oxide purity of the second oxide powder is not lower than 98%, the deposition material is composed of a pellet containing a first oxide particle and a second oxide particle, a mol ratio between a first oxide and a second oxide in deposition is 5 to 85:95 to 15, and the basicity of the pellet is not lower than 0.1. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012132086(A) 申请公布日期 2012.07.12
申请号 JP20110020724 申请日期 2011.02.02
申请人 MITSUBISHI MATERIALS CORP 发明人 MAYUZUMI YOSHIAKI;ARIIZUMI KUMIKO;KUROMITSU YOSHIO
分类号 C23C14/24;B32B9/00;C04B35/04;C04B35/057;C04B35/453;C04B35/46;C23C14/08 主分类号 C23C14/24
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