| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus to thermally regulate an object e.g. in a lithographic apparatus. <P>SOLUTION: The lithographic apparatus is configured to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus comprises: a first object; and a planar component mounted on the first object to improve heat transfer from/to a second object. <P>COPYRIGHT: (C)2012,JPO&INPIT |
