| 发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition with an excellent swelling ratio. <P>SOLUTION: The positive photosensitive resin composition contains resins (A) and a radiation-sensitive acid generator (B). At least one of the resins (A) contains a crosslinkable group as well as a structural unit (A1) having an acid group protected by an acid-dissociable group, represented by the specified general formula (1). <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012133211(A) |
申请公布日期 |
2012.07.12 |
| 申请号 |
JP20100286495 |
申请日期 |
2010.12.22 |
| 申请人 |
FUJIFILM CORP |
发明人 |
KIKUCHI WATARU;SUGIHARA KOICHI |
| 分类号 |
G03F7/039;C08F212/14;G03F7/004;G03F7/40;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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