发明名称 Al-BASED ALLOY SPUTTERING TARGET
摘要 <P>PROBLEM TO BE SOLVED: To provide an Al-based alloy sputtering target which improves the alkali corrosion resistance of an Al-Nd/La alloy generally used as a wiring material having a low electrical resistivity and excellent heat resistance. <P>SOLUTION: The Al-based alloy sputtering target includes an Al-based alloy containing Nd and/or La of 0.1-3 atom%, and the amount of Fe included in the Al-based alloy is controlled to be 1/76 or less of the total amount of Nd and/or La. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012132091(A) 申请公布日期 2012.07.12
申请号 JP20110107386 申请日期 2011.05.12
申请人 KOBELCO KAKEN:KK 发明人 OMOTO SEIICHIRO;TAKAGI TOSHIAKI
分类号 C23C14/34 主分类号 C23C14/34
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