发明名称 DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To solve such problems that, in a defect inspection device, minute defects are hard to detect since a detection signal output from a sensor includes a large portion of dark noises of the sensor itself when intensity of scattered light from a defect of a sample is smaller due to the defect size, and that it is hard to inspect the defects accurately since a pulse component of a laser source is superposed on the detection signal output from the sensor due to pulse oscillation of the laser source. <P>SOLUTION: The defect inspection device includes irradiation means for irradiating a surface of the sample with a laser beam by pulse oscillation, detection means for detecting the scattered light generated from the surface of the sample by irradiation by the irradiation means, and processing means for generating a delay signal based on the laser beam emitted by the irradiation means and processing the scattered light detected by the detection means by using the delay signal. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012132791(A) 申请公布日期 2012.07.12
申请号 JP20100285284 申请日期 2010.12.22
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MAKUUCHI MASAMI;JINGU TAKAHIRO
分类号 G01N21/956 主分类号 G01N21/956
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