发明名称 METHOD FOR CLEAVING SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a novel method for cleaving a substrate. <P>SOLUTION: A method for cleaving a substrate in order to separate a film (1') from the substrate (1), comprises the successive steps of: (i) forming a stress generation structure (2) locally connected to a surface of the substrate (1), and designed to inflate or deflate in a plane parallel to the surface of the substrate (1) by action of heat treatment; and (ii) applying heat treatment to the structure (2) designed to cause inflation or deflation to generate a plurality of local stress in the substrate (1), so that combination of the stress generates stress greater than mechanical strength of the substrate on a cleavage surface (C) parallel to the surface of the substrate defining the film (1') to be separated, and the stress results in cleavage of the substrate (1) across the surface (C). <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012134459(A) 申请公布日期 2012.07.12
申请号 JP20110241537 申请日期 2011.11.02
申请人 SOYTEC 发明人 BRUEL MICHEL
分类号 H01L21/02 主分类号 H01L21/02
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