发明名称 |
FOCUS RING AND SUBSTRATE PROCESSING APPARATUS HAVING SAME |
摘要 |
There is provided a focus ring that is capable of preventing deposits from adhering to a member having a lower temperature in a gap between two members having different temperatures. A focus ring 25 is disposed to surround a peripheral portion of a wafer W in a chamber 11 of a substrate processing apparatus 10. The focus ring 25 includes an inner focus ring 25a and an outer focus ring 25b. Here, the inner focus ring 25a is placed adjacent to the wafer W and configured to be cooled; and the outer focus ring 25b is placed so as to surround the inner focus ring 25a and configured not to be cooled. Further, a block member 25c is provided in a gap between the inner focus ring 25a and the outer focus ring 25b. |
申请公布号 |
US2012176692(A1) |
申请公布日期 |
2012.07.12 |
申请号 |
US201213344926 |
申请日期 |
2012.01.06 |
申请人 |
YAMAWAKU JUN;KOSHIMIZU CHISHIO;TOKYO ELECTRON LIMITED |
发明人 |
YAMAWAKU JUN;KOSHIMIZU CHISHIO |
分类号 |
G02B7/04;H01L21/306 |
主分类号 |
G02B7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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