VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD

摘要

A mask (60) of a vapor deposition device (50) has a periodic pattern, and only a region of the mask where a one-period pattern is formed is exposed. The length of a mask substrate in the direction perpendicular to the longitudinal direction thereof is shorter than the scanning direction length of a substrate (200) for deposition. The mask (60) is disposed so that the longitudinal direction of the mask substrate is perpendicular to the scanning direction, and is provided so that by the rotation of an unwinding roll (91) and a winding roll (92) the exposed region can be moved in the direction perpendicular to the scanning direction.