发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device capable of obtaining high breakdown voltage and high reliability by relaxing electric field concentration, and to provide a method of manufacturing the same. <P>SOLUTION: A semiconductor device comprises a semiconductor substrate, a gate electrode provided on the semiconductor substrate, a source electrode and a drain electrode provided on the substrate so as to sandwich the gate electrode, and a recess provided under the edge of the gate electrode at least at the drain electrode side. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012134345(A) 申请公布日期 2012.07.12
申请号 JP20100285681 申请日期 2010.12.22
申请人 TOSHIBA CORP 发明人 CHIN SHOSHICHI
分类号 H01L29/812;H01L21/338 主分类号 H01L29/812
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