发明名称 |
HIGH MOLECULAR WEIGHT ALKYL-ALLYL COBALTTRICARBONYL COMPLEXES AND USE THEREOF FOR PREPARING DIELECTRIC THIN FILMS |
摘要 |
A method for forming a cobalt-containing thin film by a vapor deposition process is provided. The method comprises using at least one precursor corresponding in structure to Formula (I); wherein R1 and R2 are independently C2-C8-alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously. |
申请公布号 |
US2012177845(A1) |
申请公布日期 |
2012.07.12 |
申请号 |
US201013388861 |
申请日期 |
2010.07.27 |
申请人 |
ODEDRA RAJESH;BOAG NEIL;ANTHIS JEFF;KANJOLIA RAVI;SIGMA-ALDRICH CO. LLC |
发明人 |
ODEDRA RAJESH;BOAG NEIL;ANTHIS JEFF;KANJOLIA RAVI |
分类号 |
C23C16/44;C07F15/06;C23C16/34;C23C16/50 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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