发明名称 APPARATUS AND METHOD FOR INSPECTING PATTERN
摘要 A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
申请公布号 US2012176602(A1) 申请公布日期 2012.07.12
申请号 US201213423862 申请日期 2012.03.19
申请人 UTO SACHIO;YOSHIDA MINORU;NAKATA TOSHIHIKO;MAEDA SHUNZI;SHIMODA ATSUSHI 发明人 UTO SACHIO;YOSHIDA MINORU;NAKATA TOSHIHIKO;MAEDA SHUNZI;SHIMODA ATSUSHI
分类号 G01N21/88;G01N21/33;G01N21/95;G01N21/956;H01L21/66 主分类号 G01N21/88
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