ANNEAL SYSTEM INCLUDING 2 WAY RADIO FREQUENCY PLASMA MODULE

摘要

PURPOSE: An anneal system including two way radio frequency plasma module is provided to eliminate impurity of a thin film by reducing exposure time in the hot temperature while processing a wafer. CONSTITUTION: A furnace(10) includes a heater and two RF plasma antennas. A heater control unit(24) controls the operation of the heater. Bidirectional RF plasma modules(41,42,44,45a,45b) generate RF power. The bidirectional RF plasma module distributes generated RF power to each of the two RF plasma antennas. The two RF plasma antennas are installed on the facing direction of the furnace.