| 发明名称 |
CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN |
| 摘要 |
<p>A cyclic compound represented by formula (1):
wherein L, R 1 , R', and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.</p> |
| 申请公布号 |
EP2474518(A1) |
申请公布日期 |
2012.07.11 |
| 申请号 |
EP20100812006 |
申请日期 |
2010.08.27 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
ECHIGO, MASATOSHI;HAYASHI, HIROMI |
| 分类号 |
C07C39/17;C07B61/00;C07C37/18;C07C37/20;C07C41/01;C07C41/16;C07C43/23;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C07C39/17 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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