FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE

摘要

PURPOSE: A filter, an exposure apparatus, and a method of manufacturing a device are provided to selectively transmit light having specific waves without generating a bad effect due to a factor related to the light reflected by a filter. CONSTITUTION: A filter includes a plurality of plate members(11). The plate members are arranged to be parallel between some gaps having a larger wavelength than that of an EUV(Extreme Ultraviolet) ray and a smaller wavelength than that of an infrared ray. An inner wall of the plate member is parallel to incident light(12). A normal line(13) of an enveloping surface(11c) is not parallel to a traveling direction of the incident light. The enveloping surface is formed by a cross section of the plate member on a side in which the incident light enters the filter. The plurality of plate members is supported with a holder(14).