APPARATUS AND METHOD FOR MANUFACTURING OF THIN FILM PATTERN

摘要

PURPOSE: An apparatus and a method for manufacturing a thin film pattern are provided to simplify a manufacturing process of a thin film pattern by forming a thin film pattern on a substrate through two times of a vapor deposition process. CONSTITUTION: A loadlock chamber(LL) includes at least one of a substrate storage slot and a door for entering. A transfer chamber(TC) sends a kept substrate in the loadlock to each processing chamber(PC). The processing chamber supports the sent substrate from the transfer chamber. The processing chamber forms a thin film pattern on the substrate through a vapor deposition process with a mask. A plurality of mask changing units(MCU) alternately loads a first mask and a second mask to the processing chamber.