| 摘要 |
The present invention discloses a lithographic apparatus and a method of operating the same. The lithographic apparatus comprises a projection system, and a liquid confinement structure configured toat least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas. |
