发明名称 THIN FILM, METHOD FOR FORMING SAME, AND SEMICONDUCTOR LIGHT-EMITTING ELEMENT COMPRISING THE THIN FILM
摘要 It is an object of the present invention to stably form an N-doped ZnO-based compound thin film. In the present invention, a gas containing oxygen and nitrogen and a nitrogen gas together with an organometallic material gas are supplied into a low-electron-temperature high-density plasma which is excited by microwave, thereby forming the N-doped ZnO-based compound thin film on a substrate as a film forming object.
申请公布号 KR20120079140(A) 申请公布日期 2012.07.11
申请号 KR20127011731 申请日期 2010.10.07
申请人 TOKYO ELECTRON LIMITED;TOHOKU UNIVERSITY 发明人 OHMI TADAHIRO;ASAHARA HIROKAZU;INOKUCHI ATSUTOSHI
分类号 H01L21/365;C23C16/40;C23C16/511;H01L33/42 主分类号 H01L21/365
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